KARAKTERISTIK SIFAT OPTIK DAN SIFAT LISTRIK LAPISAN TIPIS KARBON AMORF TERHIDROGENASI (a-C:H) YANG DIPABRIKASI DENGAN TEKNIK RF-PECVD

Muh Saleh(1*), Budi Priyanto(2), Yoyok Cahyono(3), Darminto Darminto(4),

(1) Universitas Negeri Makassar
(2) 
(3) 
(4) 
(*) Corresponding Author




DOI: https://doi.org/10.35580/jspf.v15i3.13503

Abstract


Lapisan tipis karbon amorf terhidrogenasi (a-C:H) telah berhasil ditumbuhkan di atas substrat kaca ITO dengan teknik Radio Frequency – Plasma Enhanced Chemical Vapor Deposition (RF–PECVD) pada frekuensi standar 13,56 MHz. Efek variasi parameter laju aliran gas metana (CH4) murni dari 40 sampai 100 sccm terhadap sifat optik dan sifat listrik lapisan a-C:H diselidiki dalam penelitian ini. Parameter temperatur substrat, tekanan deposisi, daya RF, dan waktu deposisi dibuat konstan pada nilai 100 0C, 450 mTorr, 15 W dan 120 menit. Jenis fase, ketebalan, celah pita energi dan konduktivitas listrik lapisan a-C:H masing-masing dikarakterisasi dengan Difraksi Sinar – X (XRD), Scanning Electron Microscopy (SEM), spektroskopi UV-Vis dan probe 4-titik (Four-Point Probe). Hasil karakterisasi dengan XRD menunjukkan bahwa struktur lapisan a-C:H yang diperoleh berfase amorf. Peningkatan laju aliran metana dari 40 sampai 100 sccm dengan selang 20 sccm telah meningkatkan ketebalan lapisan tipis a-C:H pada nilai 641,5 - 1256 nm dengan laju deposisi 5,43 - 10,47 nm/menit serta peningkatan konduktivitas listrik lapisan pada rentang nilai 6,90x10-2 - 7,43x10-2 S/cm yang berakibat pada penurunan celah pita energi lapisan dari 2,55 eV menjadi 2,00 eV dengan meningkatnya laju aliran metana.

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